Lithography

Metal lines
(width < 20 nm)

Metal nanodots Cr/Au
(diameter < 50 nm)

Alignment of two layers
using e-beam lithography

• Field Emission Gun (FEG) 2nm
• 5×5 cm Laser Interferometer Stage
• Stitching and Alignement <20nm
• Autofocus system

• UV Lithography
• Filtered light at 365nm
• Resolution 0.8µm
• Wafer sizes up to 4″ (100mm)
• Realignment precision <1µm

• Maskless UV lithography
• 365nm light
• Resolution 1 µm
• Wafer size up to 100 mm
• Alignment precision 1 µm