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Alcaline Wet Etching of Silicon

- Wet Chemical Etching (isotropic and anisotropic)
- Plasma-assisted Reactive Ion Etching (RIE)
Available gases: CHF3 SF6 O2
Etched Materials : Si SiO2 Si3N4 TiO2 WO3 - Metal etching by Inductively Coupled Plasma (ICP)
- Ion milling by large argon beam
- Polymer etching by oxygen plasma